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AmberLite™ HPR1300 H

In stock
Only %1 left
SKU
DWNA-AMBERLITEHPR1300H
$791.00
    Amberlite™ HPR1300 H Ion Exchange Resin is a highquality resin for use in condensate polishing beds at fossil-fired electric generating stations and in industrial demineralization applications when a balance of operating performance, simple operation, long resin life, and cost-effective operation is required. The chemical properties and particle size of the resin have been optimized to help yield excellent operating capacity and rinse characteristics, reducing chemical regenerant and rinse water usage while maintaining a superior physical stability. Amberlite™ HPR1300 H provides great mechanical strength and oxidative stability. It is ideally suited to the high flowrate demands of condensate polishing applications. The enhanced stability of this resin makes it suitable for the more challenging industrial applications or when more stringent water quality is required. In working and polishing mixed beds, it is a good choice when very low sodium leakage and conductivity is a chief concern. In condensate polishing the bead size uniformity and dark color is tailored to complement the smaller, less dense, anionic, gel Amberlite™ HPR4700 OH Ion Exchange Resin. The color distinction between this pair of resins allows easy visual confirmation of separation following backwash in mixed bed operation. In systems where exceptional resistance to surface fouling is required, Amberlite™ HPR900 OH Ion Exchange Resin is the recommended pairing. In industrial water applications Amberlite™ HPR1300 H is compatible with all system technologies and bed configurations and is designed to work with a variety of anion resins in mixed beds. Amberlite™ HPR8300 H Ion Exchange Resin is the weak acid cation resin best paired with Amberlite™ HPR1300 H for optimal performance in new and retrofitted layered beds.

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More Information
Uniformity Coefficient ≤ 1.10
Water Retention Capacity 46 - 52%
Total Exchange Capacity (eq/L) 2.0
Resin Type SAC
Particle Diameter (um) 650 ± 50
Ion Form H
Matrix (Styrenic/Acrylic) Styrenic
Matrix (Gel/Macro) Gel
Application Condensate Polishing, Demineralization, Mixed Bed Polishing